| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7834607 | Applied Surface Science | 2018 | 13 Pages |
Abstract
Oxide formation on surface of nitrogen-rich uranium nitride film/particles was investigated using X-ray photoelectron spectroscopy (XPS), auger electron spectroscopy (AES), aberration-corrected transmission electron microscopy (TEM), and high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) coupled with electron energy-loss spectroscopy (EELS). XPS and AES studies indicated that the oxidized layer on UN2-x film is ternary compound uranium oxynitride (UNxOy) in 5-10â¯nm thickness. TEM/HAADF-STEM and EELS studies revealed the UNxOy crystallizes in the FCC CaF2-type structure with the lattice parameter close to the CaF2-type UN2-x matrix. The work can provide further information to the oxidation mechanism of uranium nitride.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Zhong Long, Rongguang Zeng, Yin Hu, Jing Liu, Wenyuan Wang, Yawen Zhao, Zhipeng Luo, Bin Bai, Xiaofang Wang, Kezhao Liu,