Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7834761 | Applied Surface Science | 2018 | 24 Pages |
Abstract
Oxidation Scanning Probe Lithography (o-SPL) is an established method employed for device patterning at the nanometer scale. It represents a feasible and inexpensive alternative to standard lithographic techniques such as electron beam lithography (EBL) and nanoimprint lithography (NIL). In this work we applied non-contact o-SPL to an engineered class of molecular resists in order to obtain crosslinking by electrochemical driven oxidation. By patterning and developing various resist formulas we were able to obtain a reliable negative tone resist behavior based on local oxidation. Under optimal conditions, directly written patterns can routinely reach sub-30â¯nm lateral resolution, while the final developed features result wider, approaching 50â¯nm width.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Matteo Lorenzoni, Daniel Wagner, Christian Neuber, Hans-Werner Schmidt, Francesc Perez-Murano,