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Comparing XPS on bare and capped ZrN films grown by plasma enhanced ALD: Effect of ambient oxidation

Article ID Journal Published Year Pages File Type
7835968 Applied Surface Science 2018 10 Pages PDF
Keywords
DOXICPPEALDDXPSX-ray photoelectron spectroscopyXPSinductively coupled plasmaPlasma enhanced atomic layer deposition
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
Comparing XPS on bare and capped ZrN films grown by plasma enhanced ALD: Effect of ambient oxidation
Authors
Triratna Muneshwar, Ken Cadien,
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Journal
Applied Surface Science
Journal: Applied Surface Science
Related Categories
DOX
ICP
PEALD
DXPS
X-ray photoelectron spectroscopy
XPS
inductively coupled plasma
Plasma enhanced atomic layer deposition
Analytical Chemistry
Chemistry (General)
Electrochemistry
Inorganic Chemistry
Organic Chemistry
Physical and Theoretical Chemistry
Spectroscopy
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