Influence of plasma discharge on the structure of polytetrafluoroethylene film and step coverage on polymer substrate

Deposition of PTFE on PC without plasma treatment led to the formation of PTFE clusters up to 50 nm in diameter. The RMS roughness of the films, deposited without plasma, was about 4 nm, while the films deposited with plasma treatment had a roughness of 1.5 nm. The use of plasma has an additional effect if a PTFE coating is deposited on the PC substrate with submicrometer-sized steps. Without plasma the steps retain a rectangular shape. Deposited with the RF-discharge the PTFE layers resemble plasma-polymerised films. Under certain conditions the deposited films can fill trenches in the substrate like a wetting liquid, while under other conditions they avoid trenches and grow in between them.