Article ID Journal Published Year Pages File Type
7876479 Acta Materialia 2018 8 Pages PDF
Abstract
Epitaxial single-crystalline-like Silicon films were deposited using plasma-enhanced chemical vapor deposition on low-cost, light-weight and flexible metal foils. Controllable doping with high electron and hole mobilities were achieved.237
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
Preview
High mobility single-crystalline-like silicon thin films on inexpensive flexible metal foils by plasma enhanced chemical vapor deposition
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