Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7887172 | Ceramics International | 2018 | 7 Pages |
Abstract
During the preparation of perovskite film, the common one-step method always generates an island-like structure. Large exposed areas lead to direct contact between positive and negative electrodes. Thus, the photoelectric performance is seriously deteriorated. Here, a low-pressure assisted method was introduced to fabricate dense halide perovskite films. The crystalline quality of the films was investigated by X-ray diffraction (XRD) spectroscopy. The film morphology and the device structure were characterized by atomic force microscope (AFM) and field emission scanning electron microscopy (FESEM). The effects of film quality on charge transport were discussed. After low-pressure treatment, the open-circuit voltage (Voc), short-circuit photocurrent (Jsc), fill factor (FF) and power conversion efficiency (PCE) for the device were improved to 0.755â¯V, 20.045â¯mAâ¯cmâ2, 0.52% and 7.9%, respectively. The optimized and centrally distributed performance parameters illustrate that the low-pressure assisted method can be used to improve the quality and uniformity of perovskite films.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Yinghua Tang, Huafang Yang, Xiaogu Huang, Lixi Wang, Qitu Zhang, Siu Wing Or,