| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7911255 | Scripta Materialia | 2018 | 4 Pages |
Abstract
High aspect ratio GaN nanostructures were fabricated by photochemical etching using hydrofluoric acid as the etchant.133
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Miao-Rong Zhang, Qing-Mei Jiang, Fei Hou, Zu-Gang Wang, Ge-Bo Pan,