Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7912980 | Scripta Materialia | 2015 | 4 Pages |
Abstract
Dense nanocrystalline silicon nitride (Si3N4) samples were successfully fabricated at extremely low temperature of 1300 °C with high pressure 300 MPa by spark plasma sintering (SPS). The as-sintered sample consisted of equiaxed fine grains with an average grain size of 56 ± 13 nm. Nanocrystalline Si3N4 samples exhibited superplastic deformation at high strain rate ranging from 10â3 to 10â2 sâ1 under compression. Significant microstructural development was not observed in the deformed samples. There was no cavity damage after large deformation.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Raayaa Wananuruksawong, Yutaka Shinoda, Takashi Akatsu, Fumihiro Wakai,