Magnetic properties of iron nitride films prepared by oblique sputtering under different nitrogen gas flow ratios (N2/N2+Ar)

Iron nitride thin films were prepared on Si (100) substrates by oblique radio-frequency reactive magnetron oblique sputtering. Structures, phases and magnetic properties were investigated as a function of nitrogen gas flow ratio FN(FN=FN2/(FN2+FAr)×100%). When FN is in the range of 2-7%, the iron nitride films show amorphous or nano-crystalline structures, which exhibit good soft magnetic properties. With 3%≤FN≤6%, films show in-plane uniaxial magnetic anisotropy. Both intrinsic damping factor αin and extrinsic damping factor αex of the iron nitride films increase with increasing FN. The film deposited under FN=6% with the resonance frequency fr=3.3 GHz and full width at half-maximum Δf=3.6 GHz has great potential for high-frequency electromagnetic shielding applications.