| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7923801 | Materials Chemistry and Physics | 2011 | 6 Pages |
Abstract
⺠The effects of deposition temperature on the electrical properties of ZnO:Al film is revealed in this study. ⺠The optical properties of textured ZnO:Al films etched in diluted HCl, H3PO4 and HNO3 were studied. ⺠The effects of etching parameters on the optical and electrical properties of ZnO:Al film are investigated in this study. ⺠The diluted HNO3 is the best candidate to fabricate excellent textured surface with the highest haze ratio in this study.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Wei-Lun Lu, Kuo-Chan Huang, Chih-Hung Yeh, Chen-I Hung, Mau-Phon Houng,