Article ID Journal Published Year Pages File Type
7923814 Materials Chemistry and Physics 2011 7 Pages PDF
Abstract
► Effects of H in corporation on ZnO thin films growth and properties. ► Modification of the sputtering mechanism according to H2 percentage in the plasma. ► Structural changes turns up with variations of the surface and bulk oxide chemistry. ► Development of an hydroxide component due to atomic H incorporation.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
Preview
Role of hydrogen addition in the plasma phase in determining the structural and chemical properties of RF sputtered ZnO films
Authors
, , , , ,