| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7927213 | Optics Communications | 2017 | 5 Pages |
Abstract
A novel scheme for near-field optical lithography utilizing a metallic tip illuminated by femtosecond laser pulses with proper polarization has been presented. The strongly enhanced near field at the metallic tip offers a localized excitation source for the third harmonic generation in the nonlinear material. The generated third harmonic via excitation of nonlinear photoresist provides good exposure contrast due to the cubic intensity dependence. The spatial resolution of this novel lithography scheme is shown to be better than that of the conventional lithography technique.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Hui Zhang, Ning Zhu, Ting Mei, Miao He, Hao Li, Zhenshi Chen,