Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7929808 | Optics Communications | 2015 | 6 Pages |
Abstract
To enhance the resolution of photolithography, we demonstrate a technique that confines the exposure area by using lateral surface of nanofibers. Due to evanescent wave and optical tunneling effect, the interaction area of optical energy and the photoresist layer is confined into sub-wavelength dimension. Illuminated by a He-Cd laser device with a 442Â nm wavelength, exposed lines with sub-wavelength width were obtained by using a nanofiber with a 247Â nm diameter. Furthermore, curve lines and annular lines were obtained by manipulating the shape of nanofibers on the photoresist layer.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Zhen Wei, Jian Bai, Chen Wang, Neibin Hu, Jianfeng Xu, Yuan Yao, Yiyong Liang, Kaiwei Wang, Changlun Hou, Guoguang Yang,