Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7930101 | Optics Communications | 2015 | 4 Pages |
Abstract
Plasmonic lattice structure induced by pulsed laser was observed in the Talbot reflection effect image, which could be used to fabricate nanostructures on silicon. It is interesting that annealing and quenching effects obviously affect the localized states emission on nanosilicon prepared by pulsed laser, in which the annealing parameters are important, such as temperature and time. It is found that the laser annealing is a good way to replace the traditional annealing way in furnace, especially for rapidly annealing. A physical model is made to explain the annealing and quenching effects in the localized states emission on nanosilicon.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Wei-Qi Huang, Shi-Rong Liu, Ti-Ger Dong, Gang Wang, Cao-Jian Qin,