Interband and intraband radiation from the n-InGaAs/GaAs heterostructures with quantum wells under the conditions of injection in high lateral electric fields

The interband and intraband radiation from the n-InGaAs/GaAs heterostructures with the double and triple tunnel coupled and selectively doped quantum wells (QWs), which is appeared under the lateral electric field and in the presence of hole injection from the anode contact, has been investigated. A steep increase of the interband radiation intensity was found at the fields of E≥1.7 kV/cm. This effect should be related to the big lifetime of the injected charge carriers (~10−6 s) which exceeds by three orders of magnitude the lifetime in the similar bulk direct-band semiconductor. Its reason lies in spatial separation of the injected holes and electrons between coupled wells, firstly, by the built-in transverse electric field between wells and, secondly, due to the real-space transfer of carriers heated by the lateral electric field from the wide well to the narrow δ-doped one. Furthermore, an increase of the carrier concentration due to injection leads to an increase of that transition intensity and, consequently, to an intensity increase of the radiative intersubband transitions of carriers in QWs which results in a steep intensity increase of the far (50-120 µm) infrared radiation.