Article ID Journal Published Year Pages File Type
7939613 Superlattices and Microstructures 2017 10 Pages PDF
Abstract
This paper proposes hetero-junctionless double gate tunnel field effect transistor (HJLDG-TFETs) for suppression of subthreshold swing (SS) using an InAs compound semiconductor material. The proposed device with high dielectric material, gives an excellent performance when InAs uses at source side. Because of low band gap of 0.36eV, it reduces the potential barrier height of source channel interface causing higher band to band tunneling. Whereas, Si at the drain side with higher band gap of 1.12eV, increasing the barrier height of drain channel interface causing lower quantum tunneling. As a result, the proposed device with high-k (HfO2) at 30 nm channel section provides a tremendous characteristics with high ION/IOFF ratio of 2×1011, a point SS of 43.30mV/decade and moderate SS of 56.75mV/decade. All the above results show that the proposed device is assured for a low power switching application. The variation in gate supply voltage also analyzed for transconductance property of the device.
Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
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