Low-resistant and high transmittance films based on one dimensional metal-dielectric photonic band gap material

The paper shows the determination of the transmission of one dimensional metal-dielectric photonic band gap materials (1D-MD PBG) theoretically and experimentally. It has been found that the location and bandwidth of transmission can be tailored by initiatively adopting a suitable structure. We proposed a special 1D-MD PBG obtained by magnetron sputtering, in which each layer of metal film is not continuous. These structures have a number of advantages such as high transmittance (55% or better), broad bandwidth (the full width at half of maximum ranges from 400 nm to 780 nm) and high electrical conductivity (the sheet resistance can be lower than 0.98 Ω/square). Meanwhile, it has been also theoretically and experimental indicated that both the light transmittance and electrical conductivity could be improved effectively by using the (pqp)N structure.