Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7940417 | Superlattices and Microstructures | 2017 | 11 Pages |
Abstract
This paper proposes how to experimentally define the threshold voltage for various TFETs based on the theoretical point of view. We propose that the gate voltage defined corresponding to the peak of normalized transconductance is effectively the threshold voltage of TFETs. We also demonstrate that this definition is valid for different structures of TFET. In addition, we address the short-channel effect with such definition of threshold voltage for lateral TFET. It is shown that the short-channel effect significantly increased the off-current and the threshold voltage due to the extension of the drain potential and degradation of gate-field integrity in TFETs.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Yoshiaki Mori, Shingo Sato, Yasuhisa Omura, Avik Chattopadhyay, Abhijit Mallik,