Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7941791 | Superlattices and Microstructures | 2016 | 10 Pages |
Abstract
C-V characteristic of Al/TiO2/p-Si (100) MOS systems for the films annealed at 400 °C for the 20, 40, 60 and 80 min in ambient condition.235
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Gyanan Gyanan, Sandip Mondal, Arvind Kumar,