Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
79548 | Solar Energy Materials and Solar Cells | 2010 | 4 Pages |
Abstract
We report the fabrication of moth-eye antireflection nanostructures on AlInP compound commonly used as a window layer in high-efficiency multijunction solar cells. The broadband antireflective nanostructures were fabricated by nanoimprint lithography directly on molecular beam epitaxy grown AlInP/GaAs surface. At normal incidence, the structures exhibited an average reflectivity of 2.7% measured in a spectral range 450–1650 nm. Photoluminescence measurements of the emission from GaAs substrate suggest that the optical losses associated with the moth-eye pattern are low. Nanoimprint lithography offers a cost-effective approach to fabricate broadband antireflection coatings required in III–V high-efficiency multijunction solar cells.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Catalysis
Authors
J. Tommila, V. Polojärvi, A. Aho, A. Tukiainen, J. Viheriälä, J. Salmi, A. Schramm, J.M. Kontio, A. Turtiainen, T. Niemi, M. Guina,