| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7962121 | Computational Materials Science | 2012 | 10 Pages |
Abstract
⺠Incident energy is the most important factor to affect the film growth modes. ⺠Quasi-expitaxy growth occurs at very low incident energies. ⺠Substrate temperature slightly helps film mixing and sputtering. ⺠There is a minimum surface roughness due to the incident energy. ⺠Substrate temperature reduces the surface roughness.
Related Topics
Physical Sciences and Engineering
Engineering
Computational Mechanics
Authors
Shun-Fa Hwang, Yi-Hung Li, Zheng-Han Hong,