| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 79763 | Solar Energy Materials and Solar Cells | 2011 | 7 Pages |
Abstract
Maskless Mesoscale Materials Deposition (M3DTM) is a new direct write technique, which is versatile enough to deposit a large variety of precursors and colloidal suspensions. It is a simple and convenient process for rapid prototyping of structures and components. This maskless deposition method operates in air and at room temperature. In this study, a glycerol based polymeric precursor was used for depositing ZnO thin films on surface modified glass substrates. The parameters for deposition using M3DTM were thoroughly examined and optimized.
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Authors
Uma Choppali, Elias Kougianos, Saraju P. Mohanty, Brian P. Gorman,