| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7985508 | Materials Science and Engineering: A | 2011 | 4 Pages |
Abstract
Porous silicon was fabricated using the spark plasma sintering technique. High porosity â¼10-50% and strength â¼50-60Â MPa was obtained by tailoring the SPS variables. XRD and Raman investigations showed presence of pure silicon and exhibition of photoluminescence under visible light at wavelength â¼520Â nm confirmed the presence of porous silicon.
Related Topics
Physical Sciences and Engineering
Materials Science
Materials Science (General)
Authors
Dibyendu Chakravarty, B.V. Sarada, S.B. Chandrasekhar, K. Saravanan, T.N. Rao,