Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
798659 | Journal of Materials Processing Technology | 2009 | 5 Pages |
Abstract
The 0.7Pb(Mg1/3Nb2/3)O3–0.3PbTiO3 (PMN–PT) films were prepared by radio frequency magnetron sputtering deposited on Pt/Ti/SiO2/Si substrate. The paper aims to study the effect of sputtering gas and the effect of annealing temperature on perovskite phase formation. Phase compositions were analyzed by X-ray diffraction and the surface morphologies of the films were characterized by scanning electronic microscopy. The polarization behavior of PMN–PT films was measured using the Radiant Technologies RT6000 ferroelectric test system. The results indicate that the appropriate sputtering gas contribute to the formation of pure-perovskite phase at the appropriate post-annealing temperature.
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Authors
J.M. Wang, W.L. Li, W.D. Fei,