Article ID Journal Published Year Pages File Type
7986644 Micron 2015 6 Pages PDF
Abstract
Recent advancements in aberration-corrected electron microscopy allow for an evaluation of unexpectedly large atom displacements beyond a resolution limit of ∼0.5 Å, which are found to be dose-rate dependent in high resolution images. In this paper we outline a consistent description of the electron scattering process, which explains these unexpected phenomena. Our approach links thermal diffuse scattering to electron beam-induced object excitation and relaxation processes, which strongly contribute to the image formation process. The effect can provide an explanation for the well-known contrast mismatch (“Stobbs factor”) between image calculations and experiments.
Related Topics
Physical Sciences and Engineering Materials Science Materials Science (General)
Authors
, , , ,