| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7987100 | Micron | 2013 | 8 Pages |
Abstract
⺠PDA treated PECVD SiOxNy thin films for nano optic on chip application. ⺠AFM result reveals the variation of roughness after PDA. ⺠Raman and FTIR result demonstrates the variation in crystallite and chemical bonding. ⺠The significant shift in PL spectrum indicate the change in cluster size.
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Materials Science
Materials Science (General)
Authors
Satinder K. Sharma, Sumit Barthwal, Vikram Singh, Anuj Kumar, Prabhat K. Dwivedi, B. Prasad, Dinesh Kumar,