| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7989132 | Intermetallics | 2013 | 10 Pages |
Abstract
⺠Mg2Si thin films were grown on silicon and SOI substrates using reactive diffusion. ⺠The silicidation of magnesium was facilitated by Rapid Thermal Processing. ⺠The characterization was done by X-ray diffraction and Scanning Electron Microscopy. ⺠The substrate morphology plays a significant role in Mg2Si formation kinetics. ⺠The grown magnesium silicide films are more stable on Si(111) substrate.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Iu. Kogut, M.-C. Record,