Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7989793 | International Journal of Refractory Metals and Hard Materials | 2018 | 5 Pages |
Abstract
Ti-Si-N nanocomposite thin films usually consist of a few nm sized crystals embedded in an amorphous matrix. Here we study the influence of the Si content in Ti-Si-N films - prepared by reactive magnetron sputtering using Ti targets alloyed with intermetallic TiSi2 (to obtain Si contents of 0, 10, 15, 20, 25 at.% in the targets) - on fracture toughness (KIC) and hardness. Single cantilever bending experiments show that Ti-Si-N exhibits KIC values of up to 3.0 ± 0.2 MPaâm, which are significantly higher than those for TiN with 1.9 ± 0.2 MPaâm. Complementary nanoindentation experiments reveal also a higher hardness for Ti-Si-N with 34 ± 1 GPa as compared to 26 ± 1 GPa for TiN. The film structure is carefully studied by X-ray diffraction, X-ray photoelectron spectroscopy, and high-resolution transmission electron microscopy.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
M. Bartosik, R. Hahn, Z.L. Zhang, I. Ivanov, M. Arndt, P. Polcik, P.H. Mayrhofer,