Effect of Nb content on the microstructure and corrosion resistance of the sputtered Cr-Nb-N coatings

Thin Cr-Nb-N films with Nb content ranging from 5.1 to 19.5 at.% were prepared onto the AISI 440C substrates by reactive magnetron sputtering of the Cr and Nb in Ar-N2 gas mixture. The effects of the Nb content on the microstructure and the corrosion behavior in 3.5 wt% NaCl solution were investigated. All the deposited films showed a typical surface feature of granular structure. The Cr-Nb-N films with 5.1 at.% and 10.9 at.% Nb showed a duplex layers consisting of a dense and coherent layer near film-substrate interface, followed by a columnar layer differed from the uniform columnar structure for pure CrN. While for Cr-Nb-N films with higher Nb content, there was no obvious dense layer but a columnar structure. The low Nb content Cr-Nb-N coated samples showed a positive shift of both corrosion potential and the pitting potential compared to the pure CrN coated sample while the pitting potential decreased for high Nb content Cr-Nb-N coated samples. The Cr-Nb-N film with Nb content of 10.9 at.% possesses the best corrosion resistance due to the high polarization resistance resulted from the modification of the microstructure by the Nb incorporation.