| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8003499 | Journal of Alloys and Compounds | 2012 | 8 Pages |
Abstract
⺠Description of the co-sputtering deposition process of Mg and Ni with and without reactive H2. ⺠A mix of metallic and hydride particles forms for y > 0.33 under reactive sputtering. ⺠Electrical, optical and structural properties as well as the chemical stability of the resulting films are discussed. ⺠Low presence of metallic particles is observed for Mgâ¼2NiHâ¼4.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
T. Mongstad, C.C. You, A. Thogersen, J.P. Maehlen, Ch. Platzer-Björkman, B.C. Hauback, S. Zh. Karazhanov,