| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8012560 | Materials Letters | 2018 | 4 Pages |
Abstract
Tungsten (α-W and β-W modifications) and various tungsten carbides (W2C, WC1âx, WC) coatings were formed by chemical vapor deposition (CVD) in WF6, C3H8, H2 gas reactions. The structure of reaction products was studied by transmission electron microscopy and X-ray diffraction. The microhardness of coatings was determined by Vickers method. The mechanism of the CVD process is proposed to explain the formation of W or various (W-C) coatings and the variety of grain sizes in corresponding deposits.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
V.V. Dushik, N.V. Rozhanskii, V.O. Lifshits, T.V. Rybkina, V.P. Kuzmin,