Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8012641 | Materials Letters | 2018 | 4 Pages |
Abstract
Amorphous carbon (a-C) films were synthesized on quartz substrates through a hot-filament chemical vapor deposition (HFCVD) method. Effect of filament temperature on the thickness, structural, morphological and electrical properties of a-C films was investigated. Both the crystalline quality and sp2 content of a-C films increased by raising the filament temperature from 1800â¯Â°C to 2000â¯Â°C. Sharp increase of the surface roughness was observed as the filament temperature increased from 2000â¯Â°C to 2100â¯Â°C. The a-C films deposited at the filament temperature of 2000â¯Â°C with a high growth rate of 35â¯nm/min exhibited the optimal quality with a small roughness of 0.546â¯nm and a low resistivity of 1.67â¯Ãâ¯10â2â¯Î©Â·cm. These results indicated that HFCVD is a good method to prepare conductive a-C films rapidly and effectively.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Zihao Zhai, Honglie Shen, Jieyi Chen,