Improving the structural and optical properties of CdS films grown by Chemical Bath Deposition with adding H2O2

For the first time, H2O2 was used in CdS thin films deposition by Chemical Bath Deposition method. With the oxidant, a more compact CdS films were fabricated. The average grain size decreases from 88 nm to 15 nm with the increasing concentration of H2O2 that was used in CdS deposition. The growth mechanism has been discussed in view of the reaction between H2O2 and Cd clathrate in solution. The fill factor of CdS/CdTe device deposited on oxygenated CdS film increases about 18%.