Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8020198 | Materials Letters | 2014 | 4 Pages |
Abstract
Macroporous n-type silicon photocathodes were successfully prepared using an electrochemical etching method under constant current electrolysis at 40Â mAÂ cmâ2. We found that comparing with planar n-type and etching p-type silicon photocathodes, the macroporous n-type silicon photocathodes exhibited considerably higher photocurrent response and photoelectrochemical(PEC) performance in terms of H2 generation under visible light irradiation without requiring a catalyst or a sacrificial agent. This study provides an alternative method of preparing porous silicon and introduces a new photocatalyst or support for noble-metal nanophotocatalysts for PEC water splitting.
Related Topics
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Authors
Zuopeng Li, Jianpeng Shang, Meixia Wu, Yuexia Li, Zhiying Guo, Chenzhong Yao, Yong Guo,