Ag/TiO2/graphene stacking for plasmonic metamaterial-based transparent semiconducting thin films

The fabrication of a metamaterial structure with reduced resistivity is an attractive approach to enhance optoelectronic properties of semiconducting oxide-based thin films. In this work, a graphene/TiO2/Ag plasmonic metamaterial-based semiconducting thin film with a low resistivity (resistivity ~2.4×10−2 Ω-cm) was prepared by a simple spray pyrolysis method. The localized surface plasmon resonance at the metal-dielectric interface of silver nanoparticles was observed at 404 nm) was prepartransmittance of more than 70% above wavelength of 500 nm. The TiO2 film works as an active adsorptive centre for the deposition of chemically converted graphene layers. The stacking of graphene and TiO2 does not affect the band gap of TiO2 but it affects the conductivity of the film.