| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8022191 | Materials Letters | 2013 | 4 Pages |
Abstract
In this study, we deposited nano-Co3O4 film on silicon substrate using plasma-enhanced metal-organic chemical vapor deposition (PEMOCVD), and the structure difference of Co3O4 crystallized by the annealing and the Ar/O2 plasma techniques were explored by SEM, TEM, XRD, and XPS. Compared to the net morphology of Co3O4 film treated with high calcinations temperature, the cauliflowers-shaped micro-clusters were changed to nano-catkin when the sample was treated with Ar and O2 plasma for 40Â min. Additionally, both samples (annealed and plasma-treated) showed the formation of both the {311} and {220} planes. The surface richness of active Co3+ sites on the exposed {220} plane indicated that the as-deposited nano-Co3O4 films have potential catalytic properties for CO and hydrocarbon oxidation.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
G.L. Chen, C. Guyon, Z.X. Zhang, S. Ognier, J. Beem, M. Tatoulian,