| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8023406 | Surface and Coatings Technology | 2018 | 36 Pages |
Abstract
Diamond-like carbon (DLC) films were deposited on AISI 316L stainless steel by using a unipolar pulsed-DC plasma assisted chemical vapor deposition (PACVD) system. In order to improve the adhesion of the DLC films to the substrate, three different silicon-containing interlayers (a-Si:H, a-SiCx:H, and a-SiNx:H) were deposited at two temperatures of 150 and 350â¯Â°C using silicon tetrachloride, methane, nitrogen, and hydrogen precursors. The DLC films with silicon-containing interlayers, deposited at 150â¯Â°C, did not show appropriate adhesion to the substrate due to the presence of a high amount of chlorine and hydrogen in the structure of the interlayers. By increasing the temperature of the interlayer deposition, the adhesion of DLC films improved significantly. The results of Raman spectroscopy, Nano indentation and adhesion tests showed that the DLC film with a-SiNx:H interlayer exhibited the lowest ID/IG ratio, highest hardness, and highest adhesion to the substrate.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Soraya Delfani-Abbariki, Amir Abdollah-zadeh, Seyed Mohammad Mehdi Hadavi, Mohammad Abedi, Seyed Mohammad Reza Derakhshandeh,