Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8023518 | Surface and Coatings Technology | 2018 | 21 Pages |
Abstract
In this work, we report on the lattice damage and expansion in RbTiOPO4 induced by carbon ion implantation over a range of fluence from 2â¯Ãâ¯1013 to 5â¯Ãâ¯1013â¯ions/cm2. The samples were analyzed by means of Rutherford backscattering channeling spectrometry using both 1.4â¯MeV and 2.5â¯MeV He+ ions at a backscattering angle of 170°. The crystal lattice damage and strain of RbTiOPO4 samples with different fluencies were studied using the high resolution X-ray diffraction. The lattice expansion induced by ion implantation in the channel waveguide was measured by atomic force microscopy. The RbTiOPO4 waveguides formed by ion implantation keep perfectly transparent as shown in the transmission spectrum, indicated that few color centers remain in the ion implanted region after annealing. Surface indices nx, ny and nz of the samples as a function of ion fluence were studied. The relationship between concentration of displacements per atoms and effective refractive indices in RbTiOPO4, KTiOPO4 and KTiOAsO4 “barrierâ¯+â¯well-enhanced” waveguides was investigated.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Xiaojun Cui, Liangling Wang, Jie Shen, Haowen Zhong, Jie Zhang, Guoying Liang, Xiao Yu, Xiaofu Zhang, Xiaoyun Le,