| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8023524 | Surface and Coatings Technology | 2018 | 8 Pages |
Abstract
A novel reactive gas impulse magnetron sputtering (GIMS) technique was applied in order to deposit titanium dioxide coatings. A small volume magnetron sputtering reactor was used for that purpose, wherein titanium target was reactively sputtered under a pure oxygen atmosphere. The process resulted in a high quality nearly stoichiometric and fairly crystalline TiO2 films with a prevailing content of rutile. The coatings exhibit a strong photowetting effect - it takes 25â¯min of illumination with UV-C radiation to arrive at their “superhydrophilic” behaviour. In addition, in the discussed process of reactive GIMS deposition of titanium dioxide films, no target poisoning effect has been observed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
W. Pawlak, M. Jakubowska, A. Sobczyk-Guzenda, M. Makówka, H. Szymanowski, B. Wendler, M. Gazicki-Lipman,