Investigations of elemental composition and structure evolution in (Ti,Cu)-oxide gradient thin films prepared using (multi)magnetron co-sputtering

The paper presents results of elemental and structure investigations of (Ti,Cu)-oxide system thin films with gradient Ti and Cu elements distributions vs. thin film thickness. Thin films were prepared using multi-magnetron sputtering system equipped with separate Cu and Ti targets sputtered in reactive oxygen plasma. The elements gradient distribution was assured by programming three exemplary, different profiles of powering the magnetron equipped with Cu target: linearly increasing, V- and U-shape profile of the power. Investigations performed with the aid of transmission electron microscope integrated with X-ray energy dispersive attachment showed clearly that programmed three different exemplary magnetron powering profiles were very well reproduced in Cu and Ti elements distribution profiles. Detailed structure investigations allowed on observation of the microstructure evolution during the thin film growth and it was proven that at given deposition conditions it was strongly influenced by the amount of particular element in the selected areas of deposited coatings.