Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8025844 | Surface and Coatings Technology | 2015 | 7 Pages |
Abstract
Thin films deposited with unfiltered DC arc plasma from Ti, Ti0.75Al0.25, Ti0.50Al0.50, Ti0.30Al0.70, and Al cathodes were characterized with a scanning electron microscope for quantification of extent of macroparticle incorporation. Depositions were performed in N2 atmosphere in the pressure range from 10â 6 Torr up to 3 · 10â 2 Torr, and the formation of cathode surface nitride contamination was identified from X-ray diffraction analysis. Visual observation and photographic fixation of the arc spot behavior was simultaneously performed. A reduction in macroparticle generation with decreasing Al content and increasing N2 pressure was demonstrated. A correlated transformation of the arc from type 2 to the type 1 was visually detected and found to be a function of N2 pressure and at% of Al in the cathode. For the Ti cathode, no arc transformation was detected. These observations can be explained by a comparatively high electrical resistivity and high melting point of Al rich surface nitrides, promoting an arc transformation and a reduction in macroparticle generation.
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Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
I. Zhirkov, A. Petruhins, J. Rosen,