Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8026534 | Surface and Coatings Technology | 2015 | 10 Pages |
Abstract
Hydrogenated diamond-like carbon films were prepared on high-speed steel substrates using low pressure radio-frequency capacitively coupled discharge (13.56Â MHz) using methane mixed either with hydrogen or argon. A dc self-bias was induced by the rf discharge and accelerated the ions towards the substrates during the whole deposition process. Prior to the carbon film deposition and to improve the adhesion, the substrates were subject to plasma nitriding and coated with a silicon oxide layer using the same reactor. The deposited films were optically characterized (UV-IR) and by using a combination of Rutherford backscattering spectroscopy and elastic recoil detection the atomic composition was determined. The carbon films high hardness (~Â 18Â GPa) was assessed from indentation tests. Adhesion tests revealed critical loads up to 13.6Â N for the carbon films deposited on steel substrates using silicon oxide interlayer. Friction coefficient varied from 0.02 against diamond and 0.23 against steel counterpart. The results suggest that hard carbon films can be deposited on steel substrate using a silicon oxide intermediate layer deposited by the same plasma process with commercial potential.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Mihai-George MureÅan, Anna Charvátová Campbell, Pavel OndraÄka, Vilma BurÅ¡Ãková, Vratislav PeÅina, TomáÅ¡ Polcar, Stephan Reuter, Malte U. Hammer, Miroslav Valtr, Lenka ZajÃÄková,