| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8027281 | Surface and Coatings Technology | 2014 | 6 Pages |
Abstract
A series of amorphous Si-C-N hard films were prepared by an electron cyclotron resonance chemical vapor deposition method. Microstructure characterization revealed that amorphous Si-C-N hard films contained various bonding states. Among them, SiN and SiC bonds played a leading role in determining the microstructure of amorphous Si-C-N hard films. Mechanical measurements showed that the hardness of these films varied between 17Â GPa and 28Â GPa as a function of the tetramethylsilane flow rate. A close relation between various bonding states and hardness was found. The variation of hardness was dominated by the bond fraction that corresponded to various bonding states. Macroscopic mechanical properties of a material were illustrated from the perspective of microscopic structural characterization.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Chunqiang Zhuang, Christoph Schlemper, Regina Fuchs, Lei Zhang, Nan Huang, Michael Vogel, Thorsten Staedler, Xin Jiang,