Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8027446 | Surface and Coatings Technology | 2014 | 7 Pages |
Abstract
The microstructure evolution of Al-Si-N coatings with increasing Si content is described based on data from a multi-technique approach with data from X-ray diffraction, SEM, XPS and UV-vis. At Si contents below about 6Â at.% Si the coatings form solid solutions of Si in wurtzite (w-) AlN, while at Si concentrations between 6 and 15Â at.% Si nanocomposites consisting of a Si-saturated nanocrystalline w-Al-Si-N phase exist with Si3N4 as a tissue phase. The tissue phase formation already starts at 4Â at.% Si and is completed at 7Â at.%. Values of the refractive index and extinction coefficient as well as data from X-ray diffraction for concentrations up to 12 atomic % (at.%) of Si are consistent with the assumption of an epitaxial Si3N4 tissue phase layer of one monolayer thickness, which separates the w-Al-Si-N nanocrystals from each other in nanocomposites. Silicon contents above ca. 12Â at.% lead to the formation of a Si3N4 tissue phase with properties similar to amorphous Si3N4. A quantitative model is presented that unifies the experimental evidences into a consistent image of the microstructure at different silicon contents.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Aude Pélisson-Schecker, Hans Josef Hug, Jörg Patscheider,