| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8028087 | Surface and Coatings Technology | 2014 | 4 Pages |
Abstract
Further investigation revealed that the IEDFs' high energy tail correlates with the extent of plasma fluctuations seen at certain process conditions. Several experimental studies in recent years have broached the issue of such plasma fluctuations in magnetron discharges. However, PIC-MC simulation data could provide more detailed insights into cause and effect of this inherent discharge anomaly. Thus, it could be instructively revealed how electric field enhancements accompanying these fluctuations affect the IEDF and generation of high energy ions, respectively.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Michael Siemers, Andreas Pflug, Thomas Melzig, Kai Gehrke, Andreas Weimar, Bernd Szyszka,