Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8028762 | Surface and Coatings Technology | 2013 | 5 Pages |
Abstract
Hydrogenated amorphous carbon thin films containing fluorine (a-C:H:F) have been produced by radio-frequency plasma enhanced chemical vapor deposition by using different F/H ratios in the gas phase. The introduction of fluorine from 0 to 19Â at.% resulted in a decrease of hydrogen content and to the formation of CF and CF2 bonds. For all the films, Raman analysis showed a typical diamond-like carbon response with an evolution of the structure to larger sp2 clusters with less hydrogen while fluorine content increased. The drop in hardness generally observed in the literature with fluorine introduction was less abrupt here: for a fluorine content up to 6.5Â at.%, the measured hardness was 28Â GPa, and for 19Â at.% of fluorine, value was 20Â GPa. These are quite high values for a-C:H:F thin films. Moreover, fluorine improved tribological behavior in dry conditions with friction coefficient slightly reduced at low fluorine content and wear rate significantly reduced: divided by two to four than the fluorine free reference coating.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
C. Jaoul, C. Dublanche-Tixier, O. Jarry, P. Tristant, J.P. Lavoute, L. Kilman, M. Colas, E. Laborde, H. Ageorges,