| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8028962 | Surface and Coatings Technology | 2013 | 6 Pages |
Abstract
Reactive closed field unbalanced magnetron sputter ion plating (CFUBMSIP) provides an effective, industrially-compatible processing route for the deposition of metallic oxides, with controlled composition, structure, mechanical, electronic and optical properties. The production of crystallized as-deposited TiO2 thin coatings by reactive CFUBMSIP process is described. The arrangement of the deposition system; deposition parameters, including: working gases, deposition pressure, the sputtering power; and the influence of interlayer on the nucleation and the crystalline structure of TiO2 coatings are investigated.
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Authors
X. Zhang, K. Cooke, P. Carmichael, I.P. Parkin,