Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
802967 | Mechanics of Materials | 2008 | 14 Pages |
Abstract
Electromigration is a major road block in the pursuit of nanoelectronics and next generation power electronics. The current density in the state-of-the-art microelectronics solder joints is about 103 A/cm2. In the next generation nanoelectronics solder joints this current density is expected to increase by an order of magnitude, at least. In this paper, a new damage mechanics formulation is implemented in a general finite element procedure and used for simulation of solder joints electromigration induced failure. Nonlinear viscoplastic time-dependent nature of the material and current crowding effects are taken into account in the formulation. The model is verified against test data.
Keywords
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Physical Sciences and Engineering
Engineering
Mechanical Engineering
Authors
Cemal Basaran, Minghui Lin,