Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8029812 | Surface and Coatings Technology | 2013 | 6 Pages |
Abstract
Isotopic labeling experiments using 18O2 were carried out to understand the decomposition and oxidation reactions of source molecules in the metalorganic chemical vapor deposition (MOCVD) of strontium-doped lanthanum manganite films. The isotopic ratios of oxygen incorporated in the deposited films were determined by time-of-flight secondary ion mass spectrometry (TOF-SIMS) in both negative and positive secondary ion detection modes. The obtained M18O+/M16O+ (MÂ =Â La, Sr, Mn) ratios showed good agreement with the corresponding 18Oâ/16Oâ ratios. The oxygen incorporation from the oxidant gas (18O2) to the strontium oxide films is dominant under typical deposition conditions, while the majority of oxygen in the lanthanum oxide films originates from the ligands of the source molecules. In the complex oxide film deposition, an interaction occurred with another metal source molecules in the film deposition reaction. As a result, about three quarters of MO bonds of the original source molecules were preserved in the La0.7Sr0.3MnO3 film formation.
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Authors
Toshihiro Nakamura,