| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8030346 | Surface and Coatings Technology | 2013 | 9 Pages |
Abstract
âºCarbon films can be fabricated using C2H2 and NH3 by TCVD at 1113 K and 8 kPa. ⺠The carbon films of this study are graphite-like. ⺠The ordering degree of carbon films increases with increase of the NH3/C2H2 ratio. ⺠The number of sp2 carbon sites in films increases with increase of the NH3/C2H2 ratio. ⺠NH3 molecules show the suppressive effect at the temperature exceeding 1073 K.
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Nanotechnology
Authors
Liang-Hsun Lai, Sham-Tsong Shiue,